Accurate vapor pressure equation for trimethylindium in OMVPE

Journal of Crystal Growth

Volumn 310, Issue 7-9, 2008, Pages 2395-2398

  Shenai Khatkhate, Deodatta V ^a   DiCarlo Jr , Ronald L ^a   Ware, Robert A ^a  

^a ROHM AND HAAS COMPANY   (United States)

Author keywords

A1. Vapor pressure; A3. Metalorganic vapor phase epitaxy; A3. Organomettalic vapor phase epitaxy; B1. Metalorganics; B1. Precursors; B1. Trimethylindium

Indexed keywords

METALLORGANIC VAPOR PHASE EPITAXY; ORGANOMETALLICS; PARTIAL PRESSURE;

ORGANOMETTALIC VAPOR PHASE EPITAXY; PRECURSORS; TRIMETHYLINDIUM;

VAPOR PRESSURE;

EID: 41449111459     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.11.196     Document Type: Article

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