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Volumn 6883, Issue , 2008, Pages

Advances in roll to roll processing of optics

Author keywords

[No Author keywords available]

Indexed keywords

BRIGHTNESS ENHANCEMENT FILM (BEF); UNPATTERNED FILMS;

EID: 41149136545     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.762668     Document Type: Conference Paper
Times cited : (5)

References (33)
  • 1
    • 41149149431 scopus 로고    scopus 로고
    • History of Holography at en.wikipedia.org/wiki/BanknoteSource & www.holophile.com/history.htm
    • History of Holography at en.wikipedia.org/wiki/BanknoteSource & www.holophile.com/history.htm
  • 2
    • 41149134619 scopus 로고    scopus 로고
    • Southwall Inc. at
    • Southwall Inc. at www.southwall.com
  • 3
    • 41149166918 scopus 로고    scopus 로고
    • Commercial mask houses such as Dai Nippon Screen, Toppan or smaller imprint focused operation such as NILT
    • Commercial mask houses such as Dai Nippon Screen, Toppan or smaller imprint focused operation such as NILT.
  • 4
    • 41149162410 scopus 로고    scopus 로고
    • Commercial vendors include Kurtz and Holotools. Many of the merchant roll to roll suppliers, such as Wavefront Technologies, have captive hologram origination
    • Commercial vendors include Kurtz and Holotools. Many of the merchant roll to roll suppliers, such as Wavefront Technologies, have captive hologram origination.
  • 5
    • 41149130965 scopus 로고    scopus 로고
    • Plymouth Gratings at www.plymouthgrating.com and Ref 4.
    • Plymouth Gratings at www.plymouthgrating.com and Ref 4.
  • 8
    • 41149117263 scopus 로고    scopus 로고
    • See
    • See www.inkjetprinter.com
  • 9
    • 41149173414 scopus 로고    scopus 로고
    • See
    • See www.crystec.com/joyprie.htm
  • 10
    • 21144432461 scopus 로고    scopus 로고
    • 6 nm half-pitch lines and 0.04 mu m(2) static random access memory patterns by nanoimprint lithography
    • M. D. Austin, W. Zhang, H. X. Ge, D. Wasserman, S. A. Lyon, and S. Y. Chou, "6 nm half-pitch lines and 0.04 mu m(2) static random access memory patterns by nanoimprint lithography," Nanotechnology, 16, 1058, (2005)
    • (2005) Nanotechnology , vol.16 , pp. 1058
    • Austin, M.D.1    Zhang, W.2    Ge, H.X.3    Wasserman, D.4    Lyon, S.A.5    Chou, S.Y.6
  • 11
    • 0000373843 scopus 로고    scopus 로고
    • H Tan et. al. Roller nanoimprint lithography J. Vac. Sci. Technol. B 16.6., 1998, 3926
    • H Tan et. al. "Roller nanoimprint lithography" J. Vac. Sci. Technol. B 16.6., 1998, 3926
  • 12
    • 41149109328 scopus 로고    scopus 로고
    • www.rle.mit.edu/cips/5_03_06.Taussig2.pdf
  • 13
    • 24644470954 scopus 로고    scopus 로고
    • M. Miller et. al. Fabrication of Nanometer Sized Features on Non-Flat Substrates Using a Nano-Imprint Lithography Process, SPIE Microlithography 2005, Proceedings 5751 Emerging Lithographic Technologies IX, pp.994-1002
    • M. Miller et. al. "Fabrication of Nanometer Sized Features on Non-Flat Substrates Using a Nano-Imprint Lithography Process", SPIE Microlithography 2005, Proceedings Vol. 5751 Emerging Lithographic Technologies IX, pp.994-1002
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    • 41149158884 scopus 로고    scopus 로고
    • www.eetimes.com/news/design/showArticle.jhtml?articleID=174401743
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    • USP 5,071,206
    • USP 5,071,206.
  • 16
    • 41149104199 scopus 로고    scopus 로고
    • 3M web site at www.mmm.com
    • 3M web site at www.mmm.com
  • 17
    • 41149151017 scopus 로고    scopus 로고
    • USP 7038745
    • USP 7038745
  • 18
    • 41149122382 scopus 로고    scopus 로고
    • www.wavefronttechnology.com
  • 19
    • 41149174437 scopus 로고    scopus 로고
    • Personal communication C. Rich Wavefront Technologies Inc
    • Personal communication C. Rich Wavefront Technologies Inc.
  • 22
    • 41149119691 scopus 로고    scopus 로고
    • at
    • Solar film efficiencies at www.nre.gov/ncpv/thin_film/docs/ kaz_best_research_cells.ppt
    • Solar film efficiencies
  • 24
    • 41149152015 scopus 로고    scopus 로고
    • M.E. Beck1, I.L. Repins, J.S. Britt Process Tolerances in Roll-to-Roll Manufacturing of CIGS-Based Photovoltaics on Flexible Substrates http://www.nrel.gov/pv/thin_film/docs/gsesolarreview2005.pdf
    • M.E. Beck1, I.L. Repins, J.S. Britt "Process Tolerances in Roll-to-Roll Manufacturing of CIGS-Based Photovoltaics on Flexible Substrates" http://www.nrel.gov/pv/thin_film/docs/gsesolarreview2005.pdf
  • 25
    • 41149084765 scopus 로고    scopus 로고
    • http://www.ovonic.com/eb_so_thin_film_pv_technology_2.cfm.
  • 26
    • 41149119207 scopus 로고    scopus 로고
    • www.allbusiness.com/services/business-services/3998958-1.html
  • 27
    • 41149113698 scopus 로고    scopus 로고
    • http://www.peswiki.com/index.php/Directory:Thin_Film_Solar
  • 28
    • 41149096824 scopus 로고    scopus 로고
    • at
    • E-ink at www.eink.com
    • E-ink
  • 29
    • 41149143378 scopus 로고    scopus 로고
    • at
    • Sci Pix at www.sipix.com/technology/epaper.html
    • Sci Pix
  • 30
    • 34249878918 scopus 로고    scopus 로고
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    • Polymer Vision at www.polymervision.com/index.html
    • Polymer Vision
  • 31
    • 41149095312 scopus 로고    scopus 로고
    • http://dvice.com/archives/2006/02/new_oled_prototype_is_a_rollup.php
  • 32
    • 41149088504 scopus 로고    scopus 로고
    • www.smalltimes.com/display_article/292547/109/ARTCL/none/Techn/ Manufacturing_progress_key_to_flexible_electronics%E2%80%99_success/
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    • at
    • PolyIC at www.polyic.com
    • PolyIC


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.