Pressure-dependent characteristics and properties of Al2O 3-SiO2 thin films deposited on PET

Key Engineering Materials

Volumn 368-372 PART 2, Issue , 2008, Pages 1354-1357

  Huang, Hong Hsin ^a   Liu, Yuan Shing ^a   Yang, Cheng Fu ^b   Chen, Yen Ming ^a   Chen, Cheng Yi ^a   Wang, Moo Ching ^c  

^a CHENG SHIU UNIVERSITY   (Taiwan)

^b NATIONAL UNIVERSITY OF KAOHSIUNG   (Taiwan)

^c KAOHSIUNG MEDICAL UNIVERSITY   (Taiwan)

Author keywords

Adhesion; Al2O3 SiO2 film; E beam evaporation; Hardness; Transmittance

Indexed keywords

ADHESION; ALUMINA; ELECTRON BEAMS; EVAPORATION; HARDNESS; SCANNING ELECTRON MICROSCOPY; SILICA; X RAY DIFFRACTION;

NANOIDENTORS; OXYGEN PRESSURE; TRANSMITTANCE;

THIN FILMS;

EID: 40949154764     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: 10.4028/0-87849-473-1.1354     Document Type: Conference Paper

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