Photoresist characteristics of polyurea films prepared by vapor deposition polymerization

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 90-93

  Sato, Masatoshi ^a   Iijima, Masayuki ^a   Takahashi, Yoshikazu ^a  

^a ULVAC INC   (Japan)

Author keywords

Photoresist characteristics; Polyurea films; Vapor deposition polymerization

Indexed keywords

AROMATIC POLYMERS; EVAPORATION; FILM PREPARATION; HEAT RESISTANCE; HIGH TEMPERATURE EFFECTS; MASS SPECTROMETRY; PHOTORESISTS; POLYMERIZATION; ULTRAVIOLET RADIATION; UREA; VACUUM APPLICATIONS; VAPOR DEPOSITION;

POLYUREA FILMS;

PLASTIC FILMS;

EID: 0346046024     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00553-1     Document Type: Article

References (5)

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3. T. Strunskus and M. Grunze, in M. Ghosh and K. Mittal (eds.), Polyimides, Dekker, New York, 1996, p. 187.
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5. C. King, J. Am. Chem. Soc., 86 (1964) 437.