Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp2 phase concentration

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 4217-4221

  Lu, X ^a   Yang, Q ^b   Xiao, C ^b   Hirose, A ^b  

^a UNIVERSITY OF BRITISH COLUMBIA   (Canada)

^b UNIVERSITY OF SASKATCHEWAN   (Canada)

Author keywords

Chemical vapor deposition; Diamond film; Field electron emission

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; RAMAN SPECTROSCOPY; SURFACE MORPHOLOGY;

FIELD ELECTRON EMISSION; PHASE CONCENTRATION;

DIAMOND FILMS;

EID: 40849123996     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.12.057     Document Type: Article

References (12)

1. Uh H.S., Kwon S.J., and Lee D.K. J. Vac. Sci. Technol., B 15 (1997) 472
2. Mimura H., Yilmazoglu O., Shimawaki H., Yokoo K., Mutamba K., and Hartnagel H. J. Vac. Sci. Technol., B 21 (2003) 471
3. Matsumoto T., and Mimura H. Appl. Phys. Lett. 82 (2003) 1637
4. Koinkar P.M., Patil P.P., More M.A., Tondare V.N., and Joag D.S. Vacuum 72 (2004) 321
5. Cui J.B., Ristein J., and Ley L. Phys. Rev. Lett. 81 (1998) 429
6. Xu N.S. Ultramicroscopy 79 (1999) 59
7. Yater J.E., Shih A., Butler J.E., and Pehrsson P.E. Appl. Surf. Sci. 191 (2002) 52
8. Yater J.E., Shih A., Butler J.E., and Pehrsson P.E. J. Appl. Phys. 93 (2003) 3082
9. Yater J.E., Shih A., Butler J.E., and Pehrsson P.E. J. Appl. Phys. 96 (2004) 446
10. Gruen D.M. Annu. Rev. Mater. Sci. 29 (1999) 211
11. Yang Q., Chen W., Xiao C., Hirose A., and Bradley M. Carbon 43 (2005) 2618
12. Lu X., Yang Q., Xiao C., and Hirose A. Appl. Phys., A 82 (2005) 293