Process design and emission properties of gated n+ polycrystalline silicon field emitter arrays for flat-panel display applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 2, 1997, Pages 472-476

  Uh, Hyung Soo ^a   Kwon, Sang Jik ^b   Lee, Jong Duk ^a  

^a Seoul National University   (South Korea)

^b Gachon University College of Medicine   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001611596     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. K. Betsui, Proceedings of the 4th international Vacuum Microelectronics Conference, 1991, p. 26.
2. Y. Hori, K. Koga, and K. Sakiyama, International Electron Devices Meeting Technical Digest, 1995, p. 393.
3. H. S. Uh, S. J. Kwon, and J. D. Lee, IEEE Electron Device Lett. EDL-16, 488 (1995).
4. S. Wolf and R. N. Tauber, Silicon Processing for the VLSI Era Vol. 1-Process Technology (Lattice Press, 1986), Chap. 6.
5. E. C. Boswell, S. E. Huq, M. Huang, P. D. Prewett, and P. R. Wilshaw, Proceedings of the 8th international Vacuum Microelectronics Conference, 1995, p. 181.
6. H. H. Busta, B. J. Zimmerman, J. E. Pogemiller, M. C. Tringides, and C. A. Spindt, J. Vac. Sci. Technol. B 11, 400 (1993).
7. T. K. Ku, S. H. Chen, C. D. Yang, N. J. She, C. C. Wang, C. F. Chen, I. J. Hsieh, and H. C. Cheng, IEEE Electron Device Lett. EDL-17, 208 (1996).
8. E. A. Irene, E. Tierney, and D. W. Dong, J. Electrochem. Soc. 127, 705 (1980).
9. R. B. Marcus, T. S. Ravi, T. Gmitter, H. H. Busta, J. T. Niccum, K. K. Chin, and D. Liu, IEEE Trans. Electron Devices ED-38, 2289 (1991).