Field emission studies of CVD diamond thin films: Effect of acid treatment

Vacuum

Volumn 72, Issue 3, 2003, Pages 321-326

  Koinkar, P M ^a   Patil, P P ^a   More, M A ^a   Tondare, V N ^b   Joag, D S ^b  

^a NORTH MAHARASHTRA UNIVERSITY   (India)

^b UNIVERSITY OF PUNE   (India)

Author keywords

Atomic force microscopy; CVD diamond; Field emission; Field emission display; Raman spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DIODES; GRAPHITE; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; SURFACE ROUGHNESS;

ACID TREATMENT;

DIAMOND LIKE CARBON FILMS;

EID: 0142154975     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2003.08.010     Document Type: Article

References (23)

1. Hampsel F.J., Van Venchten J.A., Eastmann D.E. Phys Rev B. 20:1979;624.
2. Pate B.B.et al. J Vac Sci Technol. 19:1981;349.
3. Geis M.W., Gregory J.C., Pate B.B. IEEE Trans Electron Dev. 38:1991;619.
4. Cui J.B., Ristein J., Ley L. Phys Rev Lett. 81:1998;429.
5. Zhu W., Kochanski G.P., Jin S., Seibles L. J Vac Sci Technol B. 14:1996;2011.
6. Schelesser R., McClure M.T., McCarson B.L., Sitar Z. J Appl Phys. 82:1997;5763.
7. Xu N.S., Latham R.V. J Phys D. 19:1986;477.
8. Wang W.N., Fox N.A., Davis T.J., Richardson D., Lynch G.M., Steeds J.W., Lee J.S. Appl Phys Lett. 69:1996;2825.
9. Geis M.W., Twichell J.C., Macaulay J., Okano K. Appl Phys Lett. 67:1995;1328.
10. Huang Z.H., Cutler P.H., Miskorvsky N.M., Sullivan T.E. Appl Phys Lett. 65:1994;2562.
11. May P.W., Hohn S., Wang W.N., Fox N.A. Appl Phys Lett. 72(12):1998;2182.
12. Zhu W., Kochanski G.P., Jin S., Seibles L. J Appl Phys. 78:1995;2707.
13. Satyanarayana BS, Peng XL, Adamopolous G, Robetson J, Milne WI, Clyne TW. Mater Res Soc Symp Proc 2000;621:Q5.3.1.
14. Fox N.A., Mary S., Davis T.J., Wang W.N., May P.W., Bewick A., Steeds J.W., Butler J.E. Diamond Relat Mater. 6:1997;1135.
15. Okano K., Koizumi S., Silva S.R.P., Amaratunga G.A.J. Nature. 381:1996;140.
16. Fox N.A., Wang W.N., Davis T.J., Steeds J.W., May P.W. Appl Phys Lett. 71(16):1997;2337.
17. Yamada T., Sawabe A., Koizumi S., Itoh J., Okano K. Phys Stat Sol (a). 186(2):2001;257.
18. Habermann T., Gohl A., Nau D., Wedel M., Muller G., Christ M., Schreck M., Strizker B. J Vac Sci Technol B. 16(2):1998;693.
19. Sahli S., Aslam D. Appl Phys Lett. 69(14):1996;2051.
20. May P.W., Stone J.C., Ashfold M.N.R., Hallam K.R., Wang W.N., Fox N.A. Diamond Relat Mater. 7:1998;671.
21. Yuan G., Jin Y., Jin C., Han L., Wang X., Chen H., Ji H., Gu C., Wang W., Zhao H., Jiang H., Zhou T., Tian Y. J Vac Sci Technol B. 17(2):1999;688.
22. Han S.Y., Kim J.K., Lee J.L. Appl Phys Lett. 76(25):2000;3694.
23. Kang W.P., Wisitsora-at A., Davison J.L., Kerns D.V., Li Q., Xu J.F., Kim C.K. J Vac Sci Technol B. 16(2):1998;684.