Direct electrodeposition of 1.46 eV bandgap silver(I) oxide semiconductor films by electrogenerated acid

Chemistry of Materials

Volumn 20, Issue 4, 2008, Pages 1254-1256

  Ida, Yuya ^a   Watase, Seiji ^b   Shinagawa, Tsutomu ^b   Watanabe, Mitsuru ^b   Chigane, Masaya ^b   Inaba, Minoru ^a   Tasaka, Akimasa ^a   Izaki, Masanobu ^c  

^a DOSHISHA UNIVERSITY   (Japan)

^b OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE   (Japan)

^c TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; ELECTRODEPOSITION; ENERGY GAP; SEMICONDUCTOR MATERIALS; SILVER COMPOUNDS;

ELECTROGENERATED ACID; SEMICONDUCTOR FILMS;

OXIDE FILMS;

EID: 40549131646     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm702865r     Document Type: Article

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