Electrodeposition of silver(II) oxide films

Journal of the Electrochemical Society

Volumn 143, Issue 9, 1996, Pages 2741-2746

  Breyfogle, Bryan E ^a,b   Hung, Chen Jen ^a,b   Shumsky, Mark G ^a   Switzer, Jay A ^a,b  

^a MISSOURI UNIVERSITY OF SCIENCE AND TECHNOLOGY   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; ELECTRODEPOSITION; ENERGY GAP; PYROLYSIS; REFLECTION; SILVER COMPOUNDS; SOLUTIONS; TEXTURES; THERMOGRAVIMETRIC ANALYSIS; THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

CURRENT EFFICIENCIES; OPTICAL BANDGAP; RIETVELD ANALYSIS; SILVER OXIDE; WEIGHT LOSS;

METALLIC FILMS;

EID: 0030246607     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837101     Document Type: Article

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