Nanometer size recrystallization grain induced by applied electric field

Applied Surface Science

Volumn 236, Issue 1-4, 2004, Pages 57-62

  Dou, Juying ^a,b   Shang, Weijia ^a   Chen, Zhongwei ^c  

^a Santa Clara University   (United States)

^b YUNNAN UNIVERSITY   (China)

^c Hermes Microvision Inc   (United States)

Author keywords

Crystal growth; Crystal plane; Field electron microscopy; Recrystallization

Indexed keywords

CRYSTAL GROWTH; CRYSTAL ORIENTATION; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; ETCHING; GRAIN SIZE AND SHAPE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; RECRYSTALLIZATION (METALLURGY); VACUUM;

CRYSTAL GRAINS; CRYSTAL PLANES; FILED ELECTRON MICROSCOPY; VACUUM CHAMBERS;

GRAIN GROWTH;

EID: 4043099573     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.03.257     Document Type: Article

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