Surface reconstruction induced electrically in two steps

Surface Science

Volumn 539, Issue 1-3, 2003, Pages

  Dou, Juying ^a,b   Shang, Weijia ^a   Zhang, Xu ^c   Chen, Zhongwei ^c  

^a Santa Clara University   (United States)

^b YUNNAN UNIVERSITY   (China)

^c Hermes Microvision Inc   (United States)

Author keywords

Clusters; Electron emission measurements; Electron microscopy; Oxygen; Surface relaxation and reconstruction; Tungsten

Indexed keywords

ATOMS; CHEMICAL BONDS; CHEMISORPTION; CRYSTAL LATTICES; CRYSTAL ORIENTATION; ELECTRON EMISSION; ELECTRON MICROSCOPY; OXYGEN; TUNGSTEN;

FIELD ELECTRON MICROSCOPY (FEM);

SURFACE TREATMENT;

EID: 0043201270     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00610-1     Document Type: Article

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