Two-axis probing system for atomic force microscopy

Review of Scientific Instruments

Volumn 79, Issue 2, 2008, Pages

  Jayanth, G R ^a   Jhiang, Sissy M ^b   Menq, Chia Hsiang ^a  

^a Ohio State University   (United States)

^b OHIO STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; ATOMIC FORCE MICROSCOPY; COMPUTATIONAL GEOMETRY; KINEMATICS; THREE DIMENSIONAL;

GRATING STEP; MAGNETIC ACTUATORS; SURFACE TOOL; TWO-AXIS PROBING SYSTEM;

PROBES;

ARTICLE; ATOMIC FORCE MICROSCOPY; EQUIPMENT; EQUIPMENT DESIGN; EVALUATION; IMAGE ENHANCEMENT; INSTRUMENTATION; MAGNETISM; METHODOLOGY; MICROMANIPULATION; OPTICS; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; TRANSDUCER;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; IMAGE ENHANCEMENT; MAGNETICS; MICROMANIPULATION; MICROSCOPY, ATOMIC FORCE; OPTICS; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; TRANSDUCERS;

EID: 40149087523     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2841805     Document Type: Article

References (18)

1. G. Binnig, C. F. Quate, and C. Gerber, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.56.930 56, 930 (1986).
2. See www.afmuniversity.org/chapter7.html for applications of the AFM in different fields.
3. G. Meyer and N. M. Amer, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.100061 53, 1045 (1988).
4. J. E. Griffith, D. A. Grigg, M. J. Vasile, P. E. Russell, and E. A. Fitzgerald, J. Vac. Sci. Technol. A JVTAD6 0734-2101 10.1116/1.577708 10, 674 (1992).
5. S. B. Velegol, S. Pardi, X. Li, D. Velegol, and B. E. Logan, Langmuir LANGD5 0743-7463 19, 851 (2003).
6. J. K. H. Horber and M. J. Miles, Science SCIEAS 0036-8075 10.1126/science.1067410 302, 1002 (2003).
7. Y. Sugimoto, P. Pou, M. Abe, P. Jelinek, R. Perez, S. Morita, and O. Custance, Nature (London) NATUAS 0028-0836 10.1038/nature05530 446, 64 (2007).
8. B. Bhushan, J. Israelachvili, and U. Landman, Nature (London) NATUAS 0028-0836 10.1038/374607a0 374, 607 (2002).
9. A.-S. Duwez, S. Cuenot, C. Jerome, S. Gabriel, R. Jerome, S. Rapino, and F. Zerbetto, Nat. Nanotechnol. NNAABX 1748-3387 1, 122 (2006).
10. R. Resch, A. Bugacov, C. Baur, B. E. Koel, A. Madhukar, A. A. G. Requicha, and P. Will, Appl. Phys. A: Mater. Sci. Process. APAMFC 0947-8396 10.1007/s003390050769 67, 265 (1998).
11. M. Sitti, and H. Hashimoto, IEEE/ASME Trans. Mechatron. IATEFW 1083-4435 10.1109/3516.847093 5, 199 (2000).
12. Y. Martin and H. K. Wickramasinghe, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.111578 64, 2498 (1994).
13. W. Han, S. M. Lindsay, and T. Jing, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.117835 69, 4111 (1996).
14. K. J. Bruland, J. L. Garbini, W. M. Dougherty, and J. A. Sidles, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.363086 80, 1959 (1996).
15. E.-L. Florin, M. Radmacher, B. Fleck, and H. E. Gaub, Rev. Sci. Instrum. RSINAK 0034-6748 10.1063/1.1145130 65, 639 (1994).
16. S. Timoshenko and D. H. Young, Elements of Strength of Materials, 4th ed. (Van Nostrand, Princeton, 1962).
17. G. R. Jayanth, Y. Jeong, and C. H. Menq, Rev. Sci. Instrum. RSINAK 0034-6748 10.1063/1.2200874 77, 053704 (2006).
18. Y. Martin, J. Poler, and H. K. Wickramasinghe, U.S. Patent No. 5,283,442 (1 February 1994).