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Volumn 516, Issue 10, 2008, Pages 3036-3044

The effect of Cu reflow on the Pd-Cu-Ni ternary alloy membrane fabrication for infinite hydrogen separation

Author keywords

Cu reflow process; Functional gradient membrane; Infinity hydrogen separation; Pd alloy membrane; Pd Cu Ni ternary alloy membrane; Sputtering deposition

Indexed keywords

COPPER; DEPOSITION; HYDROGEN; SPUTTERING; THIN FILMS;

EID: 39649122374     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.11.126     Document Type: Article
Times cited : (25)

References (34)
  • 18
    • 39649086361 scopus 로고    scopus 로고
    • D.W. Kim, H.M. Kim, Kor. Patent No. 10-0283494, 08 Dec. 2000.
    • D.W. Kim, H.M. Kim, Kor. Patent No. 10-0283494, 08 Dec. 2000.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.