Reflow of copper in an oxygen ambient

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 5, 1998, Pages 2902-2905

  Lee, Seung Yun ^a   Kim, Dong Won ^b   Rha, Sa Kyun ^a   Park, Chong Ook ^a   Park, Hyung Ho ^c  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Kyonggi University   (South Korea)

^c Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744370017     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590292     Document Type: Article

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