Improved electrochemical performances of oxygen plasma treated LiMn 2O4 thin films

Physica Scripta T

Volumn T129, Issue , 2007, Pages 74-79

  Chen, C C ^a,c   Chiu, K F ^a   Lin, K M ^a   Lin, H C ^b   Yang, C R ^c   Wang, F M ^c  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; LITHIUM COMPOUNDS; MAGNETRON SPUTTERING; SURFACE MORPHOLOGY;

DEEP DISCHARGE; OXYGEN PLASMA TREATMENTS; REASONABLE CYCLING STABILITY;

THIN FILMS;

EID: 39549105143     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1088/0031-8949/2007/T129/017     Document Type: Conference Paper

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