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Volumn 25, Issue 8, 2004, Pages 574-576

Uniqueness in activation energy and charge-to-breakdown of highly asymmetrical DRAM Al2O3 cell capacitors

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ALUMINA; CURRENT VOLTAGE CHARACTERISTICS; DIELECTRIC PROPERTIES; DYNAMIC RANDOM ACCESS STORAGE; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRIC FIELD EFFECTS; ELECTRODES; POLYSILICON; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICE TESTING;

EID: 3943086314     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2004.831900     Document Type: Article
Times cited : (16)

References (7)
  • 1
    • 0035872897 scopus 로고    scopus 로고
    • High-κ gate dielectrics: Current status and materials properties consideration
    • G. D. Wilk, R. M. Wallace, and J. M. Anthony, "High-κ gate dielectrics: Current status and materials properties consideration," J. Appl. Phys., vol. 89, no. 10, pp. 5243-5275, 2001.
    • (2001) J. Appl. Phys. , vol.89 , Issue.10 , pp. 5243-5275
    • Wilk, G.D.1    Wallace, R.M.2    Anthony, J.M.3
  • 3
    • 0028397110 scopus 로고
    • Highly reliable ultra thin tantalum oxide capacitors in ULSI DRAMs
    • S. Kamiyama, H. Suzuki, P.-Y. Lesaicherre, and A. Ishitani, "Highly reliable ultra thin tantalum oxide capacitors in ULSI DRAMs," IEICE Trans. Electron., vol. E77-C, no. 3, pp. 379-384, 1994.
    • (1994) IEICE Trans. Electron. , vol.E77-C , Issue.3 , pp. 379-384
    • Kamiyama, S.1    Suzuki, H.2    Lesaicherre, P.-Y.3    Ishitani, A.4
  • 5
    • 0038417957 scopus 로고    scopus 로고
    • Optimization of process conditions for the formation of hemispherical grained (HSG) silicon in high-density DRAM capacitors
    • J.-Y. Hee, K. H. Soon, and K. S. Jun, "Optimization of process conditions for the formation of hemispherical grained (HSG) silicon in high-density DRAM capacitors," Mater. Sci. Semicond. Process., vol. 5, no. 6, pp. 497-503, 2002.
    • (2002) Mater. Sci. Semicond. Process. , vol.5 , Issue.6 , pp. 497-503
    • Hee, J.-Y.1    Soon, K.H.2    Jun, K.S.3
  • 6
    • 0037475077 scopus 로고    scopus 로고
    • Thermochemical description of dielectric breakdown in high dielectric constant materials
    • J. W. McPherson, J.-Y. Kim, A. Shanware, and H. C. Mogul, "Thermochemical description of dielectric breakdown in high dielectric constant materials," Appl. Phys. Lett., vol. 82, no. 13, pp. 2121-2123, 2003.
    • (2003) Appl. Phys. Lett. , vol.82 , Issue.13 , pp. 2121-2123
    • McPherson, J.W.1    Kim, J.-Y.2    Shanware, A.3    Mogul, H.C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.