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Volumn 92, Issue 6, 2008, Pages

Lack of charge offset drift is a robust property of Si single electron transistors

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE OFFSET DRIFT; SINGLE ELECTRON TRANSISTORS (SET);

EID: 39349108874     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2841659     Document Type: Article
Times cited : (14)

References (13)
  • 1
    • 39349088417 scopus 로고
    • Single Charge Tunneling (Plenum, New York).
    • H. Grabert and M. H. Devoret, Single Charge Tunneling (Plenum, New York, 1992).
    • (1992)
    • Grabert, H.1    Devoret, M.H.2
  • 2
    • 39349101144 scopus 로고    scopus 로고
    • Recent Advances in Metrology and Fundamental Constants, edited by M. W. Keller, I. T. J. Quinn, S. Leschiutta, and P. Tavella (IOS, Amsterdam), Vol.,.
    • Recent Advances in Metrology and Fundamental Constants, edited by, M. W. Keller, I. T. J. Quinn, S. Leschiutta, and, P. Tavella, (IOS, Amsterdam, 2001), Vol. CXLVI, p. 291.
    • (2001) , vol.146 , pp. 291
  • 5
    • 39349106592 scopus 로고    scopus 로고
    • Experimental Implementation of Quantum Computation (IQC'01) (Rinton, Princeton, NJ), Vol..
    • W. H. Huber, S. B. Martin, and N. M. Zimmerman, Experimental Implementation of Quantum Computation (IQC'01) (Rinton, Princeton, NJ, 2001), Vol. 76.
    • (2001) , vol.76
    • Huber, W.H.1    Martin, S.B.2    Zimmerman, N.M.3
  • 9
    • 39349099209 scopus 로고    scopus 로고
    • Foundries A and B were, respectively, located at NTT in Japan and at Cornell University in USA. The foundries are named only for identification purposes which implies neither endorsement by NIST nor that they are the best available for any particular process.
    • Foundries A and B were, respectively, located at NTT in Japan and at Cornell University in USA. The foundries are named only for identification purposes which implies neither endorsement by NIST nor that they are the best available for any particular process.
  • 10
    • 39349101501 scopus 로고    scopus 로고
    • Mesoscopic Electronics in Solid State Nanostructures (Wiley-VCH, Weinheim)
    • T. Heinzel, Mesoscopic Electronics in Solid State Nanostructures (Wiley-VCH, Weinheim, 2003), pp. 237-238.
    • (2003) , pp. 237-238
    • Heinzel, T.1
  • 13
    • 39349104447 scopus 로고    scopus 로고
    • Gate Dielectrics and MOS ULSIs (Springer, Berlin), Sec. 1.1.
    • T. Hori, Gate Dielectrics and MOS ULSIs (Springer, Berlin, 1997), Sec. 1.1.
    • (1997)
    • Hori, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.