Multilayer bipolar field-effect transistors

Applied Physics Letters

Volumn 92, Issue 6, 2008, Pages

  Cho, Shinuk ^a   Yuen, Jonathan ^a   Kim, Jin Young ^a   Lee, Kwanghee ^a,c   Heeger, Alan J ^a   Lee, Sangyun ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^c Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TRANSPORT PROPERTIES; FULLERENES; MULTILAYER FILMS; SEMICONDUCTOR MATERIALS; SOLUTIONS; TITANIUM COMPOUNDS;

ACID METHYL ESTERS; ELECTRON TRANSPORTING MATERIAL; HOLE BLOCKING; HOLE BLOCKING MATERIAL; SOLUTION PROCESSING; TITANIUM SUBOXIDES;

FIELD EFFECT TRANSISTORS;

EID: 39349103224     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2816913     Document Type: Article

References (23)

1. G. Horowitz, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/(SICI)1521-4095(199803)10:5<365::AID-ADMA365>3.3.CO;2-L 10, 365 (1998).
2. B. Crone, A. Dodabalapur, Y.-Y. Lin, R. W. Filas, Z. Bao, A. LaDuca, R. Sarpeshkar, H. E. Katz, and W. Li, Nature (London) NATUAS 0028-0836 10.1038/35000530 403, 521 (2000).
3. H. E. A. Huitema, G. H. Gelinck, J. B. P. H. van der Putten, K. E. Kuijk, C. M. Hart, E. Cantatore, P. T. Herwig, A. J. J. M. van Breemen, and D. M. de Leeuw, Nature (London) NATUAS 0028-0836 10.1038/414599a 414, 599 (2001).
4. T. D. Anthopoulos, D. M. de Leeuw, E. Cantatore, S. Setayesh, E. J. Meijer, C. Tanase, J. C. Hummelen, and P. W. M. Blom, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1812577 85, 4205 (2004).
5. E. J. Meijer, D. M. de Leeuw, S. Setayesh, E. V. Veenendaal, B.-H. Huisman, P. W. M. Blom, J. C. Hummelen, U. Scherf, and T. M. Klapwijk, Nat. Mater. NMAACR 1476-1122 10.1038/nmat978 2, 678 (2003).
6. S. Cho, J. Yuen, J. Y. Kim, K. Lee, and A. J. Heeger, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2457801 90, 063511 (2007).
7. H. Sirringhaus, N. Tessler, and R. H. Friend, Science SCIEAS 0036-8075 10.1126/science.280.5370.1741 280, 1741 (1998).
8. C. D. Dimitrakopoulos and P. R. L. Malenfant, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/1521-4095(20020116)14:2<99::AID-ADMA99>3.0. CO;2-9 14, 99 (2002).
9. A. Babel and S. A. Jenekhe, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/1521-4095(20020304)14:5<371::AID-ADMA371>3.0.CO;2-5 14, 371 (2002).
10. R. C. Haddon, A. S. Perel, R. C. Morris, T. T. M. Palstra, A. F. Hebard, and R. M. Fleming, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.115503 67, 121 (1995).
11. Y. Hayashi, H. Kanamori, I. Yamada, A. Takasu, S. Takagi, and K. Kaneko, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1861115 86, 052104 (2005).
12. K. Tada, H. Harada, and K. Yoshino, Jpn. J. Appl. Phys., Part 2 JAPLD8 0021-4922 10.1143/JJAP.36.L718 36, L718 (1997).
13. A. Babel, J. D. Wind, and S. A. Jenekhe, Adv. Funct. Mater. AFMDC6 1616-301X 10.1002/adfm.200305180 14, 891 (2004).
14. E. Kuwahara, Y. Kubozono, T. Hosokawa, T. Nagano, K. Masunari, and A. Fujiwara, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1818336 85, 4765 (2004).
15. J. Wang, H. Wang, X. Yan, H. Huang, and D. Yan, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2037204 87, 093507 (2005).
16. R. Ye, M. Baba, Y. Oishi, K. Mori, and K. Suzuki, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1949731 86, 253505 (2005).
17. Th. Lindner and G. Paasch, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2402353 101, 014502 (2007).
18. F. Dinelli, R. Capelli, M. A. Loi, M. Murgia, M. Muccini, A. Facchetti, and T. J. Marks, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200502164 18, 1416 (2006).
19. J. Y. Kim, S. H. Kim, H.-H. Lee, K. Lee, W. Ma, X. Gong, and A. J. Heeger, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200501825 18, 572 (2006).
20. M. C. Scharber, D. Mühlbacher, M. Koppe, P. Denk, C. Waldauf, A. J. Heeger, and C. J. Brabec, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200501717 18, 789 (2006).
21. D. Mühlbacher, M. Scharber, M. Morana, Z. Zhu, D. Waller, R. Gaudiana, and C. Brabec, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200600160 18, 2884 (2006).
22. S. Cho, J. Yuen, J. Y. Kim, K. Lee, and A. J. Heeger, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2361269 89, 153505 (2006).
23. S. D. Wang, K. Kanai, Y. Ouchi, and K. Seki, Org. Electron. OERLAU 1566-1199 7, 457 (2006).