Hybrid nanostructure of polypyrrole and porous silicon prepared by galvanostatic technique

Electrochimica Acta

Volumn 53, Issue 10, 2008, Pages 3734-3740

  Harraz, Farid A ^a   Salem, M S ^b   Sakka, T ^b   Ogata, Y H ^b  

^a CENTRAL METALLURGICAL RESEARCH AND DEVELOPMENT INSTITUTE CMRDI   (Egypt)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

Electrical properties; Electropolymerization; Hybrid nanostructure; Polypyrrole; Porous silicon

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRIC CONDUCTIVITY; ELECTROPOLYMERIZATION; NANOSTRUCTURED MATERIALS; POROUS SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

HYBRID NANOSTRUCTURE; ORGANIC LIQUID PHASE; ORGANIC-INORGANIC HETEROSYSTEMS;

POLYPYRROLES;

EID: 39149130665     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2007.09.019     Document Type: Article

References (25)

1. Canham L.T. Appl. Phys. Lett. 57 (1990) 1046
2. Duttagupta S.P., Chen X.L., Jenekhe S.A., and Fauchet P.M. Solid State Commun. 101 (1997) 33
3. Tsuboi T., Sakka T., and Ogata Y.H. J. Appl. Phys. 83 (1998) 4501
4. Jeske M., Schultze J.W., Thönissen M., and Münder H. Thin Solid Films 255 (1995) 63
5. Harraz F.A., Sakka T., and Ogata Y.H. Electrochim. Acta 47 (2002) 1249
6. Anderson D.G., Anwar N., Aylett B.J., Eawaker L.G., Nasir M.I., Farr J.P.G., Stiebahl K., and Keen J.M. J. Organomet. Chem. 439 (1992) C7
7. Andsager D., Hilliard J., AbuHassan L.H., Plisch M., and Nayfeh M.H. J. Appl. Phys. 74 (1993) 4783
8. Van de Leur R.M.L., and Van der Waal A. Synth. Met. 102 (1999) 1330
9. Vidal J.C., Garcia E., and Castillo J.R. Anal. Chim. Acta 381 1-3 (1999) 213
10. Vrkoslav V., Jelinek I., Broncova G., Kral V., and Dian J. Mater. Sci. Eng. C 26 (2006) 1072
11. Lewis T.W., Moulton S.E., Spinks G.M., and Wallace G.G. Synth. Met. 85 (1997) 1419
12. Nguyen Thi Le H., Garcia B., Deslouis C., and Le Xuan Q. Electrochim. Acta 46 (2001) 4259
13. Akundy G.S., and Iroh J.O. Polymer 42 (2001) 9665
14. Radhakrishnan S., and Somani P. Mater. Lett. 37 (1998) 192
15. Moreno J.D., Marcos M.L., Agulló-Rueda F., Guerrero-Lemus R., Martín-Palma R.J., Martínez-Duart J.M., and González-Velasco J. Thin Solid Films 348 (1999) 152
16. Schultze J.W., and Jung K.G. Electrochim. Acta 40 (1995) 1369
17. Errien N., Froyer G., Louarn G., and Retho P. Synth. Met. 150 (2005) 255
18. Sharma R.K., Rastogi A.C., and Desu S.B. Physica B 388 (2007) 344
19. Onganer Y., Saǧlam M., Türüt A., Efeoǧlu H., and Tüzemen S. Solid-State Electron. 39 5 (1996) 677
20. Lara J.A., and Kathirgamanathan P. Synth. Met. 110 (2000) 233
21. Harraz F.A. J. Electrochem. Soc. 153 5 (2006) C349
22. Stockert D., Lohrengel M.M., and Schultze J.W. Synth. Met. 55-57 (1993) 1323
23. Diaz A.F., and Castillo J.I. J. Chem. Soc. Chem. Commun. (1980) 397
24. Sze S.M. Modern Semiconductor Device Physics (1998), John Wiley & Sons Inc. p. 87
25. Tuyen Le.T.T., Kamloth K.P., and Liess H.-D. Thin Solid Films 292 (1997) 293