Influence of oxygen partial pressure on the properties of undoped InOx films deposited at room temperature by rf-PERTE

Journal of Non-Crystalline Solids

Volumn 354, Issue 15-16, 2008, Pages 1643-1647

  Nunes de Carvalho, C ^a   Lavareda, G ^a   Parreira, P ^a   Valente, J ^a   Amaral, A ^b   Botelho do Rego, A M ^b  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

^b INSTITUTO SUPERIOR TÉCNICO   (Portugal)

Author keywords

73.50. h; Conductivity; Indium tin oxide and other transparent conductors; Optical spectroscopy; Vapor phase deposition

Indexed keywords

COATING TECHNIQUES; EMISSION SPECTROSCOPY; INDIUM COMPOUNDS; PARTIAL PRESSURE; THERMAL EVAPORATION; VAPOR PHASE EPITAXY;

OXYGEN PARTIAL PRESSURE; ROOM TEMPERATURE;

THIN FILMS;

EID: 39149089281     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.10.004     Document Type: Article

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