Effect of hydrogen on the growth of single-walled carbon nanotubes by thermal chemical vapor deposition

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 40, Issue 4, 2008, Pages 779-784

  Rao, Fu Bo ^a,b   Li, Tie ^a   Wang, Yue Lin ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

Chemical vapor deposition; Hydrogen etching; Ratio; Single walled carbon nanotubes

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; GROWTH TEMPERATURE; HYDROGEN; IRON OXIDES; NANOPARTICLES;

HYDROGEN CONCENTRATION; HYDROGEN ETCHING; HYDROGEN TREATMENT; SINGLE WALLED CARBON NANOTUBES (SWCNT);

SINGLE-WALLED CARBON NANOTUBES (SWCN);

EID: 38949203763     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2007.09.185     Document Type: Article

References (26)

1. Dai H. Surf. Sci. 500 (2002) 218
2. Cassell A.M., Raymakers J.A., Kong J., and Dai H. J. Phys. Chem. B 103 (1999) 6484
3. Li Q.W., Yan H., Cheng Y., Zhang J., and Liu Z.F. J. Mater. Chem. 12 (2002) 1179
4. Colomer J.F., Stephan C., Lefrant S., Van G., Willems I., Konya Z., Laurent C., and Nagy J.B. Chem. Phys. Lett. 317 (2000) 83
5. Hata K., Futaba D.N., Mizuno K., Namai T., Yumura M., and Iijima S. Science 306 (2004) 1362
6. Tang S., Zhong Z., Xiong Z., Sun L., Liu L., Lin J., Shen Z.X., and Tan K.L. Chem. Phys. Lett. 350 (2001) 19
7. Zhong G.F., Iwasaki T., Robertson J., and Kawarada H. J. Phys. Chem. B 111 (2007) 1907
8. Qi H., Yuan D., and Liu J. J. Phys. Chem. C 111 (2007) 6158
9. Bhaviripudi S., Mile E., Steiner S.A., Zare A.T., Dresselhaus M.S., Belcher A.M., and Kong J. J. Am. Chem. Soc. 129 (2007) 1516
10. Okita A., Suda Y., Oda A., Nakamura J., Ozeki A., Bhattacharyya K., Sugawara H., and Sakai Y. Carbon 45 (2007) 1518
11. Zhang G., Mann D., Zhang L., Javey A., Li Y., Yenilmez E., Wang Q., McVittie J.P., Nishi Y., Gibbons J., and Dai H. Proceedings of National Academy of Science of the United States of America 102 (2005) 16141
12. Xu Y.Q., Flor E., Schmidt H., Smalley R.E., and Hauge R.H. Appl. Phys. Lett. 89 (2006) 123116
13. Nasibulin A.G., Queipo P., Shandakov S.D., Brown D.P., Jiang H., Pikhitsa P.V., Tolochko O.V., and Kauppinen E.I. J. Nanosci. Nanotechnol. 6 (2006) 1233
14. Franklin N.R., Li Y., Chen R.J., Javey A., and Dai H. Appl. Phys. Lett. 79 (2001) 4571
15. Xiong G.Y., Suda Y., Wang D.Z., Huang J.Y., and Ren Z.F. Nanotechnology 16 (2005) 532
16. Li Y., Kim W., Zhang Y., Rolandi M., Wang D., and Dai H. J. Phys. Chem. B. 105 (2001) 11424
17. Jorio A., Saito R., Hafner J.H., Lieber C.M., Hunter M., Mcclure T., Dresselhaus G., and Dresselhaus M.S. Phys. Rev. Lett. 86 (2001) 1118
18. Hennrich F., Krupke R., Lebedkin S., Arnold K., Fischer R., Resasco D.E., and Kappest M.M. J. Phys. Chem. B 109 (2005) 10567
19. Brown S.D.M., Jorio A., Corio P., Dresselhaus M.S., Dresselhaus G., Saito R., and Kneipp K. Phys. Rev. B 63 (2001) 155414
20. Anthony M.D. J. Phys. Chem. 94 (1990) 1432
21. Meyyappan M., Delzeit L., Cassell A., and Hash D. Plasma Sources Sci. Technol. 12 (2003) 205
22. Hash D., Bose D., Govindan T.R., and Meyyappan M. J. Appl. Phys. 93 (2003) 6284
23. Kuo D.H., and Su M.Y. Surf. Coat. Technol. 201 (2007) 9172
24. Liu W., Cai W., Yao L., and Li X. J. Mater. Sci. 38 (2003) 3051
25. Harutyunyan A.R., Pradhan B.K., Kim U.J., Chen G., and Eklund P.C. Nano Lett. 2 (2002) 525
26. Zhang G., Qi P., Wang X., Lu Y., Mann D., Li X., and Dai H. J. Am. Chem. Soc. 128 (2006) 6026