Photoresist characterization using double exposures with interference lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 1, 2008, Pages 128-131

  O'Reilly, Thomas B ^a   Smith, Henry I ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOSE MODULATION; INTERFERENCE LITHOGRAPHY; MICROGRAPHS;

LINEWIDTH; LITHOGRAPHY; MODULATION;

PHOTORESISTS;

EID: 38849194206     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2825169     Document Type: Article

References (9)

1. I. M. G. Moharam, Drew A. Pommet, Eric B. Grann, and T. K. Gaylord, J. Opt. Soc. Am. A 12, 1077 (1995). 0740-3232
2. J. Y. Cheng, C. A. Ross, E. L. Thomas, Henry I. Smith, and G. J. Vancso, Adv. Mater. 15, 1599 (2003). 0935-9648
3. M. Walsh, " On the design of lithographic interferometers and their application.," Ph.D. thesis, Department Of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, 2004.
4. Rodney R. Agayan, William C. Banyai, and Andres J. Fernandez, Proc. SPIE 3331, 662 (1998). 0277-786X
5. Juan C. Montoya, Chih-Hao Chang, Ralf K. Heilmann, and Mark L. Schattenburg, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.2127938 23, 2640 (2005).
6. A. Bourov, Y. Fan, F. C. Cropanese, and B. W. Smith, Proc. SPIE 5754, 1762 (2004). 0277-786X
7. A. Bourov, S. A. Robertson, B. W. Smith, M. A. Slocum, and E. C. Piscani, Proc. SPIE 6154, 1003 (2006). 0277-786X
8. Henry I. Smith, Physica E (Amsterdam) PELNFM 1386-9477 10.1016/S1386-9477(01)00184-9 11, 104 (2001).
9. T. A. Savas, M. L. Schattenburg, J. M. Carter, and Henry I. Smith, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.588613 14, 4167 (1996).