Photoresist modulation curves

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 3, 2005, Pages 1762-1768

  Bourov, Anatoly ^a   Fan, Yongfa ^a   Cropanese, Frank C ^a   Smith, Bruce W ^a  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Immersion; Interference; Lithography; Modulation curve; Photoresist; System resolution

Indexed keywords

IMMERSION; INTERFERENCE; MODULATION CURVE; SYSTEM RESOLUTION;

DETECTORS; IMAGE ANALYSIS; LIGHT MODULATION; LITHOGRAPHY; OPTICAL RESOLVING POWER; WAVE INTERFERENCE;

PHOTORESISTS;

EID: 25144457473     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602805     Document Type: Conference Paper

References (7)

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