Doppler writing and linewidth control for scanning beam interference lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2640-2645

  Montoya, Juan C ^a   Chang, Chih Hao ^a   Heilmann, Ralf K ^a   Schattenburg, Mark L ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOPPLER SCANNING; LINEWIDTH; SCANNING BEAM INTERFERENCE LITHOGRAPHY (SBIL);

DOPPLER EFFECT; MEASUREMENTS; POLARIZATION; SIGNAL INTERFERENCE;

LITHOGRAPHY;

EID: 29044445563     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2127938     Document Type: Article

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