Reducing imaging defects in high-resolution photolithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 1, 2008, Pages

  Wang, Fei ^a   Stanton, William A ^a  

^a MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGING DEFECTS; OPTICAL ILLUMINATION;

DEFECTS; FEATURE EXTRACTION; IMAGE ANALYSIS; SILICON WAFERS; SURFACE TOPOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 38849118503     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2834554     Document Type: Article

References (12)

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10. See Ref. for different types of off-axis illumination mentioned in the text.
11. F. Wang, submitted for US Patent (pending).
12. F. Wang, E. V. Russell, and W. A. Stanton, US Patent (pending).