Hydrogen effusion from tritiated amorphous silicon

Journal of Applied Physics

Volumn 103, Issue 2, 2008, Pages

  Kherani, N P ^a   Liu, B ^b   Virk, K ^a   Kosteski, T ^a   Gaspari, F ^a   Shmayda, W T ^c   Zukotynski, S ^a   Chen, K P ^b  

^a UNIVERSITY OF TORONTO   (Canada)

^b University of Pittsburgh   (United States)

^c UNIVERSITY OF ROCHESTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; DIFFUSION; FREE ENERGY; GLOW DISCHARGES; HYDROGEN; TRITIUM;

HYDROGEN EFFUSION; OXIDE LAYERS; OXYGEN DIFFUSIVITY; TRITIUM EFFUSION MEASUREMENTS;

AMORPHOUS FILMS;

EID: 38849108708     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2831495     Document Type: Article

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