Size-dependent creep behaviour of plasma-enhanced chemical vapour deposited silicon oxide films

Journal of Physics D: Applied Physics

Volumn 39, Issue 23, 2006, Pages 5054-5063

  Cao, Zhiqiang ^a   Zhang, Xin ^a  

^a BOSTON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASTICITY; RAPID THERMAL ANNEALING; SILICA; THERMAL EFFECTS;

HOMOGENEOUS FLOW; SILICON OXIDE FILMS; STRAIN GRADIENT;

THIN FILMS;

EID: 33846864243     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/23/023     Document Type: Article

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