Decrease in work function of boron ion-implanted ZnO thin films

Journal of Nanoscience and Nanotechnology

Volumn 7, Issue 11, 2007, Pages 4021-4024

  Heo, Gi Seok ^a   Hong, Sang Jin ^b   Park, Jong Woon ^a   Choi, Bum Ho ^a   Lee, Jong Ho ^a   Shin, Dong Chan ^b  

^a Korea Institute of Industrial Technology   (South Korea)

^b Chosun University   (South Korea)

Author keywords

Boron; Ion implantation; Transmittance; Work function; ZnO

Indexed keywords

ACTIVATION TIME; APPLIED (CO); CARRIER (CO); CARRIER DENSITY; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL SHEET RESISTANCE; GLASS SUBSTRATES; IMPLANTATION PROCESS; ION DOSES; OPTICAL TRANSMITTANCE (T); RAPID THERMAL ANNEAL (RTA) PROCESS; RAPID THERMAL ANNEALING (RTA); VISIBLE-WAVELENGTH RANGE; ZNO FILMS; ZNO THIN FILMS;

ANNEALING; BORON; CARRIER CONCENTRATION; CARRIER MOBILITY; CIVIL AVIATION; ELECTRIC RESISTANCE; HEALTH; ION BOMBARDMENT; ION IMPLANTATION; IONS; METALLIC FILMS; NONMETALS; OPTICAL DESIGN; OPTICAL PROPERTIES; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SEMICONDUCTING CADMIUM TELLURIDE; SEMICONDUCTING ZINC COMPOUNDS; SOLIDS; THICK FILMS; THIN FILMS; WORK FUNCTION; ZINC ALLOYS; ZINC OXIDE;

OPTICAL FILMS;

BORON; HEAVY ION; NANOMATERIAL; ZINC OXIDE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; ENERGY TRANSFER; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; RADIATION DOSE; RADIATION EXPOSURE; SURFACE PROPERTY;

BORON; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; ENERGY TRANSFER; HEAVY IONS; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; RADIATION DOSAGE; SURFACE PROPERTIES; ZINC OXIDE;

EID: 38449088704     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2007.086     Document Type: Conference Paper

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