Degradation mechanism and materials for 157 nm pellicles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 527-536

  Garza, César M ^a   Bierschenk, Tom ^b  

^a Digital DNA Laboratories   (United States)

^b FLUOR CORPORATION   (United States)

Author keywords

157nm; Cytop ; Fluorination; Fluorine; Hydrogen; Microlithography; Optical lithography; Pellicle; PVDF; Teflon AF

Indexed keywords

157 NM; CYTOP®; FLUORINATION; PELLICLES; PVDF; TEFLON AF®;

CALCIUM COMPOUNDS; CONTAMINATION; DOSIMETRY; HYDROGEN; IRRADIATION; LIGHT TRANSMISSION; MASKS; PHOTOCHEMICAL REACTIONS; POLYTETRAFLUOROETHYLENES; TRANSPARENCY;

PHOTOLITHOGRAPHY;

EID: 3843151397     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533329     Document Type: Conference Paper

References (10)

1. French, R.H., et al., Fluoropolymers for 157-nm lithography: optical properties from VUV absorbance and ellipsometry measurements. SPIE Proc, 2000. 4000: p. 1491-1502.
2. French, R.H., et al., Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography. SPIE Proc, 2001. 4346: p. 89-97.
3. French, R.H., et al., 757 nm pellicles: Polymer design for transparency and lifetime. SPIE Proc, 2002. 4691: p. 57.
4. Grenville, A., et al., Behavior of candidate organic pellicle materials under 157 nm laser irradiation. SPIE Proc, 2002. 4691: p. 56.
5. Forsythe, J.S, Hill, D.J.T, Logethesis, A.L, Whittaker, A.K, Polym. Degrad. Stab. 1999, 63, 95.
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7. nd ed., pp: 319-320. Macmillan Publishing Co, New York. 1981.
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10. P. Zimmerman, International SEMATECH, private communication.