New materials for 193-nm trilayer imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 1138-1148

  Meador, Jim D ^a   Holmes, Doug ^a   Nagatkina, Mariya ^a   Puligadda, Rama ^a   Gum, Denise ^a   Bennett, Randy ^a   Sun, Sam ^a   Enomoto, Tomoyuki ^b  

^a BREWER SCIENCE INC   (United States)

^b NISSAN CHEMICAL INDUSTRIES LTD   (Japan)

Author keywords

193 nm microlithography; 248 nm; Antireflective; BARC; Hardmask; Spin on; Trilayer

Indexed keywords

BINDERS; CATALYST SELECTIVITY; ELECTRIC RESISTANCE; IMAGING TECHNIQUES; PLASMA APPLICATIONS; PLASMA ETCHING; REFLECTION; SILICON; SPIN COATING; THERMOSETS;

193-NM MICROLITHOGRAPHY; 248NM; ANTIREFLECTIVE; BARC; HARDMASKS; SPIN-ON; TRILAYER;

PHOTOLITHOGRAPHY;

EID: 3843146045     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.533539     Document Type: Conference Paper

References (6)

1. Jim D. Meador et al., "193-nm Multilayer Imaging Systems," Proc. SPIE, 5039, pp. 948-959, 2003.
2. M. Slezak, "Multilayer resist strategies," Solid State Technology, July 2003, p. 38.
3. G. Xu et al., "New Antireflective Coatings for 193 nm Lithography," Proc. SPIE, 3333, pp. 524-531, 1998.
4. Jim D. Meador et al., "Recent Progress in 193 nm Antireflective Coatings," Proc. SPIE, 3678, pp. 800-809, 1999.
5. J. Meador et al., "Second-Generation 193-nm Bottom Antireflective Coatings (BARCs)," Proc. SPIE, 3999, pp. 1009-1018, 2000.
6. J. Meador et al., "Improved Crosslinkable Polymeric Binders for 193-nm Bottom Antireflective Coatings (BARCs)," Proc. SPIE, 4345, pp. 846-854, 2001.