Multilayer resist strategies

Solid State Technology

Volumn 46, Issue 7, 2003, Pages

  Slezak, Mark ^a  

^a JSR Micro   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; COPOLYMERS; LITHOGRAPHY; MULTILAYERS; POROSITY; REACTIVE ION ETCHING; SILICA; SUBSTRATES; THICKNESS MEASUREMENT;

BILAYER PHOTORESISTS; MALEIC ANHYDRIDE; NORBORNENES; SILSESQUIOXANE;

PHOTORESISTS;

EID: 0042312548     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. J. Meador et al., "193nm Multilayer Imaging Systems," SPIE, 2003.
2. R. Hung et al., "Development of SSQ-based 157nm Photoresist," Proceedings Photopolymer, 2002.
3. M. Hussein et al., "A Novel Approach to Dual Damascene Patterning," Proceedings IITC, 2002.