Overcoming limitations of etalon spectrometers used for spectral metrology of DUV excimer light sources

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 846-858

  Rafac, Robert J ^a  

^a CYMER INC   (United States)

Author keywords

Bandwidth; Chromatic aberration; Excimer laser; Metrology; Spectrometer

Indexed keywords

CHROMATIC ABERRATION; ETALON SPECTROMETERS; IMAGE CONTRAST; OPTICAL PROXIMITY (OPC);

ABERRATIONS; ETALONS; EXCIMER LASERS; MOIRE FRINGES; SPECTROMETERS; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 3843137149     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.556622     Document Type: Conference Paper

References (4)

1. "Contribution of polychromatic illumination to optical proximity effects in the context of Deep-UV lithography", A. Kroyan, I. Lalovic, N. R. Farrar, Proc. 21st Annual BACUS Symposium on Photomask Technology and Management, G. T. Dao and B. J. Grenon (Eds.), Monterey CA, SPIE Vol. 4562, pp. 1112-1120, 2002.
2. "Understanding chromatic aberration impacts on lithographic imaging", K. Lai, I. Lalovic, R. Fair, A. Kroyan, C. Progler, N. R. Farrar, D. Ames, K. Ahmed, J. Microlithography, Microfabrication and Microsystems, Vol. 2, Issue 2, pp. 105-111, 2003.
3. "Modeling the effects of excimer laser bandwidth on lithographic performance" A. Kroyan, J. J. Bendik, O. Semprez, N. R. Farrar, C. G. Rowan and C. A. Mack, SPIE Vol. 4000, Optical Microlithography XIII, pp. 658-664, March 2000.
4. "Effects of 95% integral vs. FWHM bandwidth specifications on lithographic imaging", A. Kroyan, I. Lalovic and N. R. Farrar, SPIE Vol. 4346, Optical Microlithography XIV, pp. 1244-1253, March 2001.