Contributions of stepper lenses to systematic CD errors within exposure fields

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2440, Issue , 1995, Pages 868-877

  Liu, Hua Yu ^a   Yu, Crid ^a   Gleason, Robert ^a  

^a HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC VARIABLES MEASUREMENT; ERRORS; INTEGRATED CIRCUIT MANUFACTURE; LITHOGRAPHY;

ABERRATION PATTERNS; CRITICAL DIMENSION CONTOUR MAPS; ELECTRICAL RESISTANCE; I LINE STEPPERS; RETICLE ERRORS; STEPPER LENSES; STREHL INTENSITY; SYSTEMATIC LINE WIDTH ERRORS;

LENSES;

EID: 0029238899     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)