Impact of synchronization errors on overlay and CD control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4691 II, Issue , 2002, Pages 840-852

  Luce, Emmanuelle ^a   Mougel, Sébastien ^a   Goirand, Pierre Jérôme ^a   Depré, Jérôme ^b  

^a STMICROELECTRONICS   (Italy)

^b ASM Lithography Montbonnot   (France)

Author keywords

EL DoF; Intrafield CD dispersion; KrF ArF Step Scan; Lateral vibrations; MSD

Indexed keywords

IMAGE QUALITY; PHOTODEGRADATION; SCANNING; SYNCHRONIZATION;

SCANNERS;

EXPOSURE CONTROLS;

EID: 0036413366     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474634     Document Type: Article

References (4)

1. G. de Zwart et al., "Performance of a Step & Scan system for DUV Lithography" Proceedings on SPIE Vol. 2197, p.953-964, 1994.
2. T. Uchiyama et al., "Effect of stage synchronisation error of KrF scan on 0.18um patterning", Proceedings on SPIE Vol.3334, p. 67-76, 1998.
3. J. Bischoff et al., "Simulations on Step & Scan Optical Lithography" Proceedings on SPIE Vol. 3051, p.817-835, 1997.
4. M. Klaassen et al., "Dynamic Performance of DUV Step & Scan Systems and Process Latitude", Proceedings on SPIE Vol.4000, Mar 2000.