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Volumn 4343, Issue 1, 2001, Pages 646-653
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Flatness correction of NZTE mask blank substrates
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Author keywords
EUVL; Flatness; IBF; Mask Blanks; NZTE Material; Roughness; ULE ; ZERODUR
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ERROR CORRECTION;
INTERFEROMETRY;
ION BEAMS;
NATURAL FREQUENCIES;
PHOTOLITHOGRAPHY;
POLISHING;
SUBSTRATES;
SURFACE ROUGHNESS;
THERMAL EXPANSION;
THERMODYNAMIC STABILITY;
ULTRAVIOLET RADIATION;
FLATNESS CORRECTION;
MASKS;
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EID: 0034758360
PISSN: 0277786X
EISSN: None
Source Type: Journal
DOI: 10.1117/12.436634 Document Type: Article |
Times cited : (5)
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References (5)
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