Mask and Source Optimization for Lithographic Imaging Systems

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5182, Issue , 2004, Pages 88-102

  Erdmann, Andreas ^a   Farkas, Richard ^b   Fühner, Tim ^a   Tollkühn, Bernd ^a   Kókai, Gabriela ^b  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Genetic algorithms; Image modeling; Optical lithography; Resolution enhancement

Indexed keywords

GENETIC ALGORITHMS; INTEGRATED CIRCUITS; MASKS; MATHEMATICAL MODELS; MICROPROCESSOR CHIPS; OPTIMIZATION; PHASE SHIFT; PHOTORESISTS; STEPPING MOTORS;

IMAGE MODELING; RESOLUTION ENHANCEMENT;

IMAGING SYSTEMS;

EID: 1942518723     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504732     Document Type: Conference Paper

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