Characterization of new ultra thick chemically amplified positive tone photoresists suitable for electroplating application

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 2, 2004, Pages 915-923

  Voigt, Anja ^a   Heinrich, Marina ^a   Gruetzner, Gabi ^a  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

Chemically amplified resist; Electroplating; Polymers; Positive tone photoresist; Ultra thick

Indexed keywords

ASPECT RATIO; DIFFERENTIAL SCANNING CALORIMETRY; ELECTROPLATING; MICROELECTROMECHANICAL DEVICES; POLYETHERS; POLYPROPYLENES; THIN FILMS;

CHEMICALLY AMPLIFIER RESISTS (CAR); MICROFLUIDICS; POSITIVE TONE PHOTORESISTS; ULTRA-THICK;

PHOTORESISTS;

EID: 3843081754     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535205     Document Type: Conference Paper

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