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Volumn 10, Issue 3, 2008, Pages 519-523
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Effect of thermal annealing on r.f. sputtering-deposited nanocrystalline GaNxAs1-x thin films
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Author keywords
GaNAs semiconductors; Optical properties of nanocrystals; Photoluminescence of nitride compounds
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Indexed keywords
ANNEALING;
CONCENTRATION (PROCESS);
NANOCRYSTALLINE MATERIALS;
THIN FILMS;
NITRIDE COMPOUNDS;
RADIO FREQUENCY (RF);
NANOCRYSTALS;
ARSENIC;
GALLIUM;
NANOCRYSTAL;
NITROGEN;
AMBIENT AIR;
ARTICLE;
FILM;
PHOTOACOUSTIC SPECTROSCOPY;
PHOTOLUMINESCENCE;
POLARIMETRY;
PRIORITY JOURNAL;
SEMICONDUCTOR;
STRUCTURE ANALYSIS;
X RAY DIFFRACTION;
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EID: 38349190295
PISSN: 13880764
EISSN: None
Source Type: Journal
DOI: 10.1007/s11051-007-9267-x Document Type: Article |
Times cited : (2)
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References (10)
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