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Volumn 103, Issue 1, 2008, Pages

Electronic states of chemically treated SiC surfaces

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROLYTIC POLISHING; ELECTRON TUNNELING; ELECTRONIC STATES; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR MATERIALS; SURFACE CHARGE;

EID: 38149003060     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2829804     Document Type: Article
Times cited : (8)

References (18)
  • 2
    • 0036905198 scopus 로고    scopus 로고
    • Materials Research Society Symposia Proceedings Vol., (Materials Research Society, Pittsburgh).
    • C. K. Inoki, T. S. Kuan, C. D. Lee, A. Sagar, and R. M. Feenstra, Materials Research Society Symposia Proceedings Vol. 722, K1.3.1 (Materials Research Society, Pittsburgh, 2002).
    • (2002) , vol.722 , pp. 131
    • Inoki, C.K.1    Kuan, T.S.2    Lee, C.D.3    Sagar, A.4    Feenstra, R.M.5
  • 8
    • 0001266820 scopus 로고    scopus 로고
    • PRLTAO 0031-9007 10.1103/PhysRevLett.82.1000.
    • V. Ramachandran and R. M. Feenstra, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.82.1000 82, 1000 (1999).
    • (1999) Phys. Rev. Lett. , vol.82 , pp. 1000
    • Ramachandran, V.1    Feenstra, R.M.2
  • 9
    • 0001453511 scopus 로고
    • PRBMDO 0163-1829 10.1103/PhysRevB.50.4561.
    • R. M. Feenstra, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.50.4561 50, 4561 (1994).
    • (1994) Phys. Rev. B , vol.50 , pp. 4561
    • Feenstra, R.M.1
  • 12
    • 0242677567 scopus 로고    scopus 로고
    • JVTBD9 1071-1023 10.1116/1.1606466.
    • R. M. Feenstra, J. Vac. Sci. Technol. B JVTBD9 1071-1023 10.1116/1.1606466 21, 2080 (2003).
    • (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 2080
    • Feenstra, R.M.1
  • 14
    • 0001379442 scopus 로고
    • For simplicity and clarity of presentation we have neglected the "dopant-induced" component in the tunneling current arising from electron occupation of the conduction band due to the doping [see, JVTBD9 0734-211X, ()]. This component certainly does not occur in the experiment because there are sufficient numbers of surface states so that such occupation does not occur until very large negative voltages, and in the theoretical curve for zero surface charge density we neglect it since it obscures the onset of the valence band edge.
    • For simplicity and clarity of presentation we have neglected the "dopant-induced" component in the tunneling current arising from electron occupation of the conduction band due to the doping [see R. M. Feenstra and J. A. Stroscio, J. Vac. Sci. Technol. B JVTBD9 0734-211X 5, 923 (1987)]. This component certainly does not occur in the experiment because there are sufficient numbers of surface states so that such occupation does not occur until very large negative voltages, and in the theoretical curve for zero surface charge density we neglect it since it obscures the onset of the valence band edge.
    • (1987) J. Vac. Sci. Technol. B , vol.5 , pp. 923
    • Feenstra, R.M.1    Stroscio, J.A.2
  • 17
    • 38149135160 scopus 로고
    • Physics of Semiconductor Devices, 2nd ed. (Wiley, New York),.
    • S. M. Sze, Physics of Semiconductor Devices, 2nd ed. (Wiley, New York, 1981), p. 391.
    • (1981) , pp. 391
    • Sze, S.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.