Tungsten oxide/tungsten nanocrystals for nonvolatile memory devices

Applied Physics Letters

Volumn 92, Issue 1, 2008, Pages

  Chen, C H ^a   Chang, T C ^b   Liao, I H ^c   Xi, P B ^b   Hsieh, Joe ^c   Chen, Jason ^c   Huang, Tensor ^c   Sze, S M ^d   Chen, U S ^a   Chen, J R ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c ProMOS Technologies Inc   (Taiwan)

^d NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ELECTRON TUNNELING; LAYERED MANUFACTURING; MEAN FIELD THEORY; NANOCRYSTALS; OXIDATION; THERMAL EFFECTS; THRESHOLD VOLTAGE; TUNGSTEN COMPOUNDS;

NONVOLATILE MEMORY DEVICES; REASONABLE FORMATION MECHANISMS; THRESHOLD VOLTAGE SHIFTS;

NONVOLATILE STORAGE;

EID: 38049053446     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2822401     Document Type: Article

References (13)

1. S. Tiwari, F. Rana, K. Chan, H. Hanafi, C. Wei, and D. Buchanan, Tech. Dig.-Int. Electron Devices Meet. TDIMD5 0163-1918 1995, 521.
2. Z. Liu, C. Lee, V. Narayanan, G. Pei, and E. C. Kan, IEEE Trans. Electron Devices IETDAI 0018-9383 10.1109/TED.2002.802617 49, 1606 (2002).
3. A. Thean and J. P. Leburton, IEEE Potentials ZZZZZZ 0278-6648 21, 35 (2002).
4. P. H. Yeh, L. J. Chen, P. T. Liu, D. Y. Wang, and T. C. Chang, Electrochim. Acta ELCAAV 0013-4686 52, 2920 (2007).
5. S. S. Kwang, S. J. Choi, J. Y. Choi, E. J. Jang, B. K. Kim, S. J. Park, D. G. Cha, I. Y. Song, J. B. Park, Y. Park, and S. H. Choi, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2335677 89, 083109 (2006).
6. F. M. Yang, T. C. Chang, P. T. Liu, P. H. Yeh, Y. C. Yu, J. Y. Lin, S. M. Sze, and J. C. Lou, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2716845 90, 132102 (2007).
7. S. P. Murarka, Silicide for VLSI Application (Academic, Orlando, 1983).
8. Simon M. Sze and Kwok K. Ng, Physics of Semiconductor Devices (Wiley, New Jeresy, 2007).
9. Masahiro Katoh and Yohei Takeda, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 43, 7292 (2004).
10. O. Kubaschewski and B. E. Hopkins, Oxidation of Metals and Alloys (Butterworths, London, 1953).
11. R. Beyers, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.333738 56, 147 (1984).
12. S. Zirinsky, W. Hammer, F. d'Herule, and J. Baglin, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.90151 33, 76 (1978).
13. D. K. Sadana, A. E. Morgan, M. H. Norcott, and S. Naik, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.339414 62, 2830 (1987).