How to measure atomic diffusion processes in the sub-nanometer range

Acta Materialia

Volumn 56, Issue 3, 2008, Pages 464-470

  Schmidt, H ^a,c   Gupta, M ^b,c   Gutberlet, T ^c   Stahn, J ^c   Bruns, M ^d  

^a CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

^c PAUL SCHERRER INSTITUTE   (Switzerland)

^d KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Amorphous materials; Diffusion; Neutron reflectometry

Indexed keywords

AMORPHOUS ALLOYS; DIFFUSION; ISOTOPES; MULTILAYERS; NEUTRON REFLECTION; SEMICONDUCTOR MATERIALS; SOLID STATE DEVICES;

ATOMIC DIFFUSION PROCESSES; FUNDAMENTAL TRANSPORT PROCESS; SUB-NANOMETER RANGE;

NANOMECHANICS;

EID: 37849044140     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2007.10.005     Document Type: Article

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