Characterization of gaseous species in scanning atmospheric rf plasma with transmission infrared spectroscopy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 1, 2008, Pages 123-127

  Kim, Seong H ^a   Kim, Jeong Hoon ^b   Kang, Bang Kwon ^c  

^a The Pennsylvania State University   (United States)

^b APPLASMA   (United States)

^c Ajou University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COATING DEPOSITION; IR ANALYSES; REACTION PRODUCTS; SUPERHYDROPHOBIC COATINGS;

CHARACTERIZATION; DEPOSITION; HYDROPHOBICITY; INFRARED SPECTROSCOPY; OXYGEN;

PLASMAS;

EID: 37849021930     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2823483     Document Type: Article

References (19)

1. F. S. Denes and S. Manolache, Prog. Polym. Sci. PRPSB8 0079-6700 29, 815 (2004).
2. P. K. Chu, J. Y. Chen, L. P. Wang, and N. Huang, Mater. Sci. Eng., R. MIGIEA 0927-796X 10.1016/S0927-796X(02)00004-9 36, 143 (2002).
3. B. Eliasson, M. Hirth, and U. Kogelschatz, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/20/11/010 20, 1421 (1987).
4. H.-S. Ahn, N. Hayashi, S. Ihara, and C. Yamabe, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.42.6578 42, 6578 (2003).
5. M. Shimozuma, G. Tochitani, and H. Tagashira, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.349667 70, 645 (1991).
6. T. Ikuno, S. Takahasi, K. Kamada, S. Ohkura, S.-I. Honda, M. Katayama, T. Hirao, and K. Oura, Surf. Rev. Lett. SRLEFH 0218-625X 10, 611 (2003).
7. N. Krstulovic, I. Labazan, S. Milosevic, U. Cvelbar, A. Vesel, and M. Mozetic, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/39/17/014 39, 3799 (2006).
8. J. P. Vinogradov, A. Dinkelmann, and A. Lunk, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/37/21/010 37, 3000 (2004).
9. S. H. Kim, J. H. Kim, and B. K. Kang, Langmuir LANGD5 0743-7463 23, 8074 (2007).
10. J.-H. Kim, G. Liu, and S. H. Kim, J. Mater. Chem. JMACEP 0959-9428 10.1039/b516329c 16, 977 (2006).
11. S. H. Kim, J.-H. Kim, B.-K. Kang, and H. S. Uhm, Langmuir LANGD5 0743-7463 21, 12213 (2005).
12. H. R. Allcock, L. B. Steely, S. H. Kim, J. H. Kim, and B.-K. Kang, Langmuir LANGD5 0743-7463 23, 8103 (2007).
13. C. J. Liu, A. Marafee, R. Mallinson, and L. Lobban, Appl. Catal., A ACAGE4 0926-860X 164, 21 (1997).
14. S. H. Kim, H. S. Kim, J. S. Hwang, J. G. Choi, and P. J. Chong, Chem. Mater. CMATEX 0897-4756 10.1021/cm00039a005 6, 278 (1994).
15. J. Ropcke, G. Revalde, M. Osiac, K. Li, and J. Meichsner, Plasma Chem. Plasma Process. PCPPDW 0272-4324 22, 137 (2002).
16. S. J. Harris, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.342696 65, 3044 (1989).
17. M. Meyyappan, L. Delzeit, A. Cassell, and D. Hash, Plasma Sources Sci. Technol. PSTEEU 0963-0252 10.1088/0963-0252/12/2/312 12, 205 (2003).
18. R. K. Garg, J. P. Gore, T. S. Fisher, D. Hash, and M. Meyyappan, Proceedings of the 2003 Third IEEE Conference on Nanotechnology, San Francisco, CA, 2003, pp. 1-4.
19. G. Herzberg, Molecular Spectra and Molecular Structure, 2nd ed. (Van Nostrand, New York, 1950).