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Volumn 254, Issue 7, 2008, Pages 2059-2066

Probability of ionization of sputtered particles as a function of their energy. Part I: Negative Si - ions

Author keywords

Energy distribution; Escape depth; Secondary ion yield; SIMS

Indexed keywords

IONIZATION; NEGATIVE IONS; NUCLEAR ENERGY; PROBABILITY DISTRIBUTIONS; SPUTTERING;

EID: 37749031022     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.08.032     Document Type: Article
Times cited : (8)

References (18)
  • 1
    • 0003127705 scopus 로고
    • Angular, energy, and mass distribution of sputtered particles
    • Behrisch R., and Wittmaack K. (Eds), Springer-Verlag
    • Hofer W.O. Angular, energy, and mass distribution of sputtered particles. In: Behrisch R., and Wittmaack K. (Eds). Sputtering by Particle Bombardment III, Topics in Applied Physics vol. 64 (1991), Springer-Verlag
    • (1991) Sputtering by Particle Bombardment III, Topics in Applied Physics , vol.64
    • Hofer, W.O.1
  • 8
    • 37749054331 scopus 로고    scopus 로고
    • Electronic database: New Semiconductor Materials. Characteristics and Properties, Ioffe Physical Technical Institute, S-Petersburg, http://www.ioffe.ru/SVA/NSM/.
  • 18
    • 37749000833 scopus 로고    scopus 로고
    • Y. Kudriatsev, A. Villegas, S. Gallardo, G. Ramirez, R. Asomoza, On the escape depth of sputtered particles, will be published.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.