High-temperature epitaxy of metastable sulfides on oxide substrates using stoichiometric transportation

Advanced Materials

Volumn 13, Issue 21, 2001, Pages 1624-1627

  Yoo, Y Z ^a   Chikyow, T ^b   Ahmet, P ^b   Kawasaki, M ^c   Makino, T ^d   Segawa, Y ^d   Koinuma, H ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

^d INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LATTICE MATCHING; STOICHIOMETRIC TRANSPORTATION;

BINDING ENERGY; EXCITONS; MASS SPECTROMETRY; MOLECULAR BEAM EPITAXY; PULSED LASER DEPOSITION; STOICHIOMETRY; SUBSTRATES; THERMODYNAMIC STABILITY;

ZINC SULFIDE;

EID: 37649026061     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(200111)13:21<1624::AID-ADMA1624>3.0.CO;2-B     Document Type: Article

References (15)