An ab initio evaluation of cyclopentadienyl precursors for the atomic layer deposition of hafnia and zirconia

ECS Transactions

Volumn 11, Issue 7, 2007, Pages 113-121

  Zydor, Aleksandra ^a   Elliott, Simon D ^a   Leese, Thomas ^b   Song, Fuquan ^b   Rushworth, Simon ^b  

^a UNIVERSITY COLLEGE CORK   (Ireland)

^b SAFC Hitech   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMINES; ATOMS; CALCULATIONS; DIELECTRIC MATERIALS; HAFNIUM OXIDES; LIGANDS; ORGANOMETALLICS; ZIRCONIA;

AB INITIO CALCULATIONS; CYCLOPENTADIENYL PRECURSOR; CYCLOPENTADIENYLS; INSULATING LAYERS; MONOMER STRUCTURES; PRECURSOR MOLECULES; SURFACE EFFECT; THIN-FILM DIELECTRICS;

ATOMIC LAYER DEPOSITION;

EID: 37549059338     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2779075     Document Type: Conference Paper

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