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Volumn 20, Issue 4, 2007, Pages 519-522

Control of morphology orientation in lithographically patternable diblock copolymers

Author keywords

Block copolymer; Graphoepitaxy; Photolithography; Self assembly

Indexed keywords


EID: 37549029701     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.519     Document Type: Article
Times cited : (4)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.