Control of morphology orientation in lithographically patternable diblock copolymers

Journal of Photopolymer Science and Technology

Volumn 20, Issue 4, 2007, Pages 519-522

  Bosworth, Joan K ^a   Andre, Xavier ^a   Schwartz, Evan L ^a   Ruiz, Ricardo ^b   Black, Charles T ^b,c   Ober, Christopher K ^a  

^a School of Chemical and Molecular Engineering   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

Block copolymer; Graphoepitaxy; Photolithography; Self assembly

Indexed keywords

EID: 37549029701     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.519     Document Type: Article

References (11)

1. G. M. Walraff, W. D. Hinsberg, Chem. Rev., 99 (1999) 1801.
2. M. J. Fasolka, A. M. Mayes, Annu. Rev. Mater. Res. 31 (2001) 323.
3. M. Li, K. Douki, K. Goto, X. Li, C. Coenjarts, D. M. Smilgies, C. K. Ober, Chem. Mater. 16 (2004) 3800.
4. C. K. Ober, M. Li, K. Douki, K. Goto, X. Li, J. Photopolym. Sci. Tech. 16 (2003) 347.
5. C. Harrison, D. H. Adamson, Z. Cheng, J. M. Sebastian, S. Sethuraman, D. A. Huse, R. A. Register, P. M. Chaikin, Science 290 (2000) 1558.
6. I. Tokarev, R. Krenek, Y. Burkov, D. Schmeisser, A. Sidorenko, S. Minko, M. Stamm, Macromolecules 38 (2005) 507.
7. K. A. Cavicchi, K. J. Berthiaume, T. P. Russell, Polymer 46 (2005) 11635.
8. C. T. Black, O. Bezencenet, IEEE Trans. Nanotechnol. 3 (2004) 412.
9. S. H. Kim, M. J. Misner, T. Xu, M. Kimura, T. P. Russell, Adv. Mater. 16 (2004) 226.
10. S. Kim, H. Solak, M. Stoykovich, N. Ferrier, J.J. de Pablo, P. Nealey, Nature 2003, 424, 411.
11. M. K. Georges, R. P. N. Veregin, P. M. Kazmaier, G. K. Hamer, Macromolecules 26 (1993) 2987.