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Volumn 20, Issue 4, 2007, Pages 519-522
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Control of morphology orientation in lithographically patternable diblock copolymers
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Author keywords
Block copolymer; Graphoepitaxy; Photolithography; Self assembly
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Indexed keywords
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EID: 37549029701
PISSN: 09149244
EISSN: 13496336
Source Type: Journal
DOI: 10.2494/photopolymer.20.519 Document Type: Article |
Times cited : (4)
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References (11)
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