Fabrication and characterization of millimeter-size dielectric membranes prepared by RF sputtering and bulk micromachining techniques

Sensor Letters

Volumn 5, Issue 3-4, 2007, Pages 552-558

  Sharma, Preeti ^a   Koul, Shiban K ^a   Chandra, Sudhir ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Buckling; Bulk micromachining; Dielectric membrane; RF sputtering; Sputtered Si3N4; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; BUCKLING; CHARACTERIZATION; CMOS INTEGRATED CIRCUITS; MEMS; MICROMACHINING; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS;

BULK MICROMACHINING; DIELECTRIC MEMBRANES; MILLIMETER-SIZE MEMBRANES; RF SPUTTERING;

DIELECTRIC FILMS;

EID: 37349089177     PISSN: 1546198X     EISSN: None     Source Type: Journal    
DOI: 10.1166/sl.2007.230     Document Type: Article

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