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Volumn 202, Issue 9, 2008, Pages 1728-1732

Erratum to "Microstructural study of composite C-Cu films deposited by dc magnetron sputtering" [Surface & Coatings Technology (2008) 1728-1732] (DOI:10.1016/j.surfcoat.2007.07.032);Microstructural study of composite C-Cu films deposited by dc magnetron sputtering

(4) Onoprienko, A A a Danilenko, N I a Kossko, I A a Gorban, V F a

a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE (Ukraine)

Author keywords

Amorphous carbon; Composite; Diffusion; Electron diffraction; Sputtering; Structure; Transmission electron microscopy

Indexed keywords

ANNEALING; COALESCENCE; DIFFUSION; HARDNESS; INDENTATION; MAGNETRON SPUTTERING; METALLOGRAPHIC MICROSTRUCTURE; PARTICLE SIZE; THIN FILMS;

DC MAGNETRON SPUTTERING; MICROSTRUCTURAL STUDY;

COMPOSITE COATINGS;

ANNEALING; COALESCENCE; COMPOSITE COATINGS; DIFFUSION; HARDNESS; INDENTATION; MAGNETRON SPUTTERING; METALLOGRAPHIC MICROSTRUCTURE; PARTICLE SIZE; THIN FILMS;

EID: 37349024740 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2008.09.012 Document Type: Erratum

Times cited : (2)

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