Radical species involved in hotwire (catalytic) deposition of hydrogenated amorphous silicon

Thin Solid Films

Volumn 516, Issue 6, 2008, Pages 929-939

  Zheng, Wengang ^a   Gallagher, Alan ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

Amorphous silicon; Catalytic deposition; Hotwire deposition; Radicals

Indexed keywords

CATALYST ACTIVITY; DEPOSITION; HIGH PRESSURE EFFECTS; IONIZATION; MASS SPECTROMETERS; REACTION RATES;

CATALYTIC DEPOSITIONS; HOTWIRE DEPOSITIONS; OPTIMUM DEVICES; RADICALS;

AMORPHOUS SILICON;

EID: 37349003867     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.05.002     Document Type: Article

References (26)

1. Sol. Energy Mater. Sol. Cells 78 (2003) 1 (review this application)
2. Molenbroek E.C., Mahan A.H., Johnson E.J., and Gallagher A. J. Appl. Phys. 79 (1996) 7278
3. Doyle J., Robertson R., Lin G.H., He M.Z., and Gallagher A. J. Appl. Phys. 64 (1988) 3215
4. Mahan A.H., Mason A., Nelson B.P., and Gallagher A. Mater. Res. Soc. Symp. Proc. 609 (2000) A6.6
5. Holt J.K., Swiatek M., Goodwin D.G., and Atwater H.A. J. Appl. Phys. 92 (2002) 4803
6. Duan H.L., Zaharias G.A., and Bent S.F. Appl. Phys. Lett. 78 (2001) 1784
7. Tange S., Inoue K., Tonokura K., and Koshi M. Thin Solid Films 395 (2001) 42
8. Nozaki Y., Kongo K., Miyazaki T., Kitazoe M., Horii K., Umemoto H., Masuda A., and Matsumura H. J. Appl. Phys. 88 (2000) 5437
9. Nozaki Y., Kitazoe M., Horii K., Umemoto H., Masuda A., and Matsumura H. Thin Solid Films 395 (2001) 47
10. Perrin J., Shiratani M., Kae-Nune P., Videlot H., Jolly J., and Guillon J. J. Vac. Sci. Technol. A16 (1998) 278
11. Umemoto H., Ohara K., Morita D., Nozaki Y., Masuda A., and Matsumura H. J. Appl. Phys. 91 (2002) 1650
12. Perrin J., Shiratani M., Kae-Nune P., Videlot H., Jolly J., and Guillon J. J. Vac. Sci. Technol. 16 (1998) 278
13. Zheng W., and Gallagher A. Surf. Sci. 600 (2006) 2207
14. Singh H., Coburn J.W., and Graves D.B. J. Vac. Sci. Technol., A, Vac. Surf. Films 17 (1999) 2447
15. W. Zheng Ph.D. Thesis, University of Colorado, Boulder, CO, 2005.
16. Freund R.S., Wetzel R.C., Shul R.J., and Hayes T.R. Phys. Rev., A 41 (1990) 3575
17. Tarnovsky V., Deutsch H., and Becker K. J. Chem. Phys. 105 (1996) 6315
18. Chatham H., Hils D., Robertson R., and Gallagher A. J. Chem. Phys. 81 (1984) 1770
19. j(v/4) for a stable gas.
20. Nomura H., Akimoto K., Kono A., and Goto T. J. Phys., D 28 (1995) 1977
21. Itabashi N., Kato K., Nishiwaki N., Goto T., Yamada C., and Hirota E. Jpn. J. Appl. Phys. 28 (1989) L-325
22. Shakhatov V.A., De Pascale O., Capitelli M., Hassouni K., Lombardi G., and Gicquel A. Phys. Plasmas 12 (2005) 23504
23. Arthur N.L., and Miles L.A. J. Chem. Soc., Faraday Trans. 93 (1997) 4259
24. Holt J.K., Swiatek M., Goodwin D.G., Muller R.P., Goddard W.A., and Atwater H.A. Thin Solid Films 395 (2001) 29
25. Nakajima Y., Tomokura K., Sugimoto K., and Koshi M. Int. J. Chem. Kinetics 33 (2000) 136
26. Colegrove B.T., and Schaefer H.F. J. Phys. Chem. 94 (1990) 5593