Tin whisker growth induced by high electron current density

Journal of Electronic Materials

Volumn 37, Issue 1, 2008, Pages 17-22

  Lin, Y W ^a   Lai, Yi Shao ^b   Lin, Y L ^c   Tu, Chun Te ^d   Kao, C R ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b ADVANCED SEMICONDUCTOR ENGINEERING INC   (Taiwan)

^c NATIONAL CENTRAL UNIVERSITY   (Taiwan)

^d Henkel Accurus Scientific Co Ltd   (Taiwan)

Author keywords

Current crowding; Electromigration; Tin whisker

Indexed keywords

CURRENT CROWDING; CURRENT-CROWDING EFFECTS; TIN WHISKERS;

CRYSTAL GROWTH; CURRENT DENSITY; ELECTROMIGRATION; SILICON WAFERS;

CRYSTAL WHISKERS;

EID: 37249026781     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-007-0219-0     Document Type: Article

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